X-ray lithography in development

Share on facebook
Share on twitter
Share on linkedin
Share on whatsapp
X-ray lithography in development

In proximity lithography, smaller wavelength beams mean smaller and more precise etching of circuits, translating to smaller chip size, faster speed and lower costs. A San Diego company, JMAR Industries, is pushing the envelope and opening up new possibilities for IC designers using beams from four solid state amplifiers that converge to create plasma on copper tape, generating extremely precise x-ray emission.

For more technical information, go to