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Applied Materials enters 12" wet clean market with new Oasis Clean system

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Applied Materials enters 12" wet clean market with new Oasis Clean system

On June 19, Applied Materials announced its 12″ single-wafer Oasis Clean system, which it claims offers new technology for the nearly 50 critical cleaning steps needed to fabricate the transistor area of the chip while providing customers with the significantly faster production cycle time and particle removal performance necessary for nanometer chip manufacturing.

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